最近写了一篇关于CHF₃废气处理的一篇综述，文章被接受后刚上网，还没有正式出版，就收到了来自澳大利亚CSIRO的一个Chief Research Scientist的email：

“I noticed your review of CHF₃ destruction in Journal of Fluorine Chemistry. You have done a good job in covering a broad range of processes. Thank you for referring to my work.

I should update you on the application of the PLASCON plasma process; it is now being used commercially in Mexico and the USA for CHF₃ destruction. In fact the cost is very similar to incineration – the main cost is the NaOH or similar chemicals required to capture and neutralise the HF formed in the process.

P.S. I should make clear that this is not in any way a complaint – I know from experience it is almost impossible to keep up with the development of industrial processes, since they are usually not described in the scientific literature.”

在综述中，有一个section是关于等离子体处理其他HFCs（含氟烃）废气（Plasma destruction）的. 由于自己没有做过这方面的工作，我只是简单介绍了这种废气处理工艺，并举了澳大利亚CSIRO的PLASCON作为工业应用的例子。在小结中我评论到这种方法处理温度高，产物复杂，能耗高。结果这么快就收到了他的质疑email并附上了他的相关文章（虽然他自己在P.S.中说不是：this is not in any way a complaint）。